Lawyer Joseph W. Treloar, graduated from Rutgers University, B.S., Chemical Engineering, 2001 New York University School of Law, J.D., 2004, is now employed by Frommer Lawrence & Haug LLP at 745 Fifth Avenue, 10th Floor New York, NY 10151.

While being a member of New York Intellectual Property Law Association., Joseph W. Treloar is one of the more than one million lawyers in United States. Before choosing Joseph W. Treloar as your lawyer, you should consider whether Joseph W. Treloar offers free consultation, (if not) how much the initial interview costs, if there is any hidden attorney fees, what's the fee schedule, whether he or she has good community reputation and is able to provide a list of good references. You can also contact the Board of Professional Responsibility of the state bar, to find out if Joseph W. Treloar has ever been placed under any disciplinary actions. Please be aware that, though Joseph W. Treloar's office is located at New York, NY, he or she might belong to the bar association of other states.

You should also ask how long the lawyer has been in practice, how much experience he or she has in cases like yours, and more importantly, the outcomes of those cases! Focus of the lawyer's practice and years of experience are also very important factors in your evaluation process. The more focused the lawyer's practice areas, the better service he or she could provide. So do not make decisions solely on one or two factors. Only hire lawyers you feel comfortable with as they will represent you and your interests, and you will be sharing private details about your life with them.

Joseph W. Treloar has been admitted in 2004, New Jersey and U.S. District Court, District of New Jersey; 2005, New York and U.S. District Court, Southern and Eastern Districts of New York; registered to practice before U.S. Patent and Trademark Office, 2007. His or her practice areas include Intellectual Property(100%); Patents; Copyrights; Trademarks; Trade Secrets.

Joseph W. Treloar's college and law school education includes Rutgers University, B.S., Chemical Engineering, 2001, New York University School of Law, J.D., 2004. Other biographical background includes Co-Author of copyright portion of "Model Jury Instructions: Copyright, Trademark and TradeDress Litigation," American Bar Association, Section of Litigation (May 2008).. You should contact other lawyers and law firms nearby before choosing your legal representatives.

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