Lawyer Daniel Kurowski, graduated from Loyola University John Marshall Law School, 2005, is now employed by Hagens Berman Sobol Shapiro, LLP at 1144 W. Lake Street, Suite 400 Oak Park, IL 60301.Daniel Kurowski is one of the more than one million lawyers in United States. Before choosing Daniel Kurowski as your lawyer, you should consider whether Daniel Kurowski offers free consultation, (if not) how much the initial interview costs, if there is any hidden attorney fees, what's the fee schedule, whether he or she has good community reputation and is able to provide a list of good references. You can also contact the Board of Professional Responsibility of the state bar, to find out if Daniel Kurowski has ever been placed under any disciplinary actions. Please be aware that, though Daniel Kurowski's office is located at Oak Park, IL, he or she might belong to the bar association of other states.

You should also ask how long the lawyer has been in practice, how much experience he or she has in cases like yours, and more importantly, the outcomes of those cases! Focus of the lawyer's practice and years of experience are also very important factors in your evaluation process. The more focused the lawyer's practice areas, the better service he or she could provide. So do not make decisions solely on one or two factors. Only hire lawyers you feel comfortable with as they will represent you and your interests, and you will be sharing private details about your life with them.

Daniel Kurowski has been admitted in 2005, Illinois. His or her practice areas include .

Daniel Kurowski's college and law school education includes Loyola University, John Marshall Law School, 2005. You should contact other lawyers and law firms nearby before choosing your legal representatives.

If you are the owner or employee of Hagens Berman Sobol Shapiro, LLP, and want to update the information, please create a new account and then Claim & Edit Hagens Berman Sobol Shapiro, LLP. If you want to add your attorney firm, please create a new account.